This work, which considers the chemistry of metals, includes methods of preparing ultra-thin metal films and chemical vapour deposition (CVD), with an emphasis on microelectronics applications. Chapter One, an introduction, discusses the applications of metal CVD as well as the types of processes used for metal deposition, and rationalizes which materials are used and why they are chosen. Chapters Two through Eight discuss CVD of Al (2), W (3), Cu from Cu(II) precursors (4), Cu from Cu(I) precursors (5), Au and Ag (6), Pt, ...
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This work, which considers the chemistry of metals, includes methods of preparing ultra-thin metal films and chemical vapour deposition (CVD), with an emphasis on microelectronics applications. Chapter One, an introduction, discusses the applications of metal CVD as well as the types of processes used for metal deposition, and rationalizes which materials are used and why they are chosen. Chapters Two through Eight discuss CVD of Al (2), W (3), Cu from Cu(II) precursors (4), Cu from Cu(I) precursors (5), Au and Ag (6), Pt, Pd and Ni (7), and CVD of Ta, Cr, Mo, Fe, Co, Rh, Ir and less common metals (8). Chapter 9 summarizes the results from these chapters. Some fundamental physical and chemical phenomena that occur in CVD reactors are also discussed to provide a basis from which data in the literature can be interpreted. The goal of this work is to bring together all aspects of the CVD of metals in a way that is useful for all those who work in this field. The book should be suitable for scientists developing novel coating techniques.
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Seller's Description:
Good; Hardcover; Moderate wear to the covers; Unblemished textblock edges; Name inside the front cover; The endpapers and all text pages are clean and unmarked; The binding is excellent with a straight spine; This book will be shipped in a sturdy cardboard box with foam padding; Medium Format (8.5"-9.75" tall); White, blue, and green covers with title in black lettering; 1994, Wiley-VCH Publishing; 530 pages; "The Chemistry of Metal CVD, " by Toivo T. Kodas & Mark J. Hampden-Smith.
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Seller's Description:
Very Good; Hardcover; Light wear to the covers; Unblemished textblock edges; The endpapers and all text pages are clean and unmarked; The binding is excellent with a straight spine; This book will be shipped in a sturdy cardboard box with foam padding; Medium-Large Format (Quatro, 9.75Äù Äì 10.75Äù tall); White, blue, and green covers with title in black lettering; 1994, Wiley-VCH Publishing; 530 pages; "The Chemistry of Metal CVD, " by Toivo T. Kodas & Mark J. Hampden-Smith.
Choose your shipping method in Checkout. Costs may vary based on destination.
Seller's Description:
Good++; Hardcover; Clean covers with minor edgewear; Unblemished textblock edges; Name inside the front cover; The endpapers and all text pages are clean and unmarked; The binding is excellent with a straight spine; This book will be stored and delivered in a sturdy cardboard box with foam padding; Medium Format (8.5? ? 9.75? tall); White, blue, and green covers with title in black lettering; 1994, Wiley-VCH Publishing; 530 pages; "The Chemistry of Metal CVD, " by Toivo T. Kodas & Mark J. Hampden-Smith.
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Seller's Description:
Fair. No dust jacket. Fair+ condition. COVER (hardcover without dust jacket, as issued)-moderate wear; slight stains, clean overall. PAGES-underlinings on several pages, no notes; bends at margins on several pages, slight tears on one page; occasional minor stains, clean overall. Not ex-library. 500+ pgs.
