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- ISBN: 9780819427779
Edition
ISBN: 0819427772 /
ISBN-13: 9780819427779
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Paperback,
Very Good
Metrology, Inspection, and Process Control for Microlithography XII: 23-25 February 1998, Santa Clara, California [Spie Proceedings, Volume 3332]
by Singh, Bhanwar, Ed
1998, International Society for Optical Engineering (SPIE), Bellingham, Wash
ISBN-13:
9780819427779
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Tiber Books
HIGH
Cockeysville,
MD,
USA
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$20.00
$140.00
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- Edition:
- 1998, International Society for Optical Engineering (SPIE), Bellingham, Wash
-
Paperback,
Very Good
|
- Details:
- ISBN:
0819427772
- ISBN-13:
9780819427779
- Publisher:
International Society for Optical Engineering (SPIE), Bellingham, Wash
- Published:
1998
- Language:
English
- Alibris ID:
8675655320
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- Shipping Options:
- Standard Shipping: $4.80
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- Seller's Description:
- Very good. 4to, paperback. Vg condition. Ex-lib copy w/ light markings to opening pgs, spine label neatly removed; short tear to cover edge, few pgs creased, spine slightly smudged; contents clean, binding tight. xv, 744 p. Co-sponsored by Semiconductor Equipment and Materials International.
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- Edition:
- 1998, Society of Photo Optical
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Paperback,
Good
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- Details:
- ISBN:
0819427772
- ISBN-13:
9780819427779
- Publisher:
Society of Photo Optical
- Published:
1998
- Language:
English
- Alibris ID:
17874169607
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- Shipping Options:
- Standard Shipping: $4.80
Choose your shipping method in Checkout. Costs may vary based on destination.
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- Seller's Description:
- Good. Access codes and supplements are not guaranteed with used items. May be an ex-library book.
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