Add this copy of Modeling of Chemical Vapor Deposition of Tungsten Films to cart. $47.91, new condition, Sold by Ingram Customer Returns Center rated 5.0 out of 5 stars, ships from NV, USA, published 2013 by Birkhauser Verlag AG.
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New. Progress in Numerical Simulation for Microelectronics . 139 p. Intended for college/higher education audience. In Stock. 100% Money Back Guarantee. Brand New, Perfect Condition, allow 4-14 business days for standard shipping. To Alaska, Hawaii, U.S. protectorate, P.O. box, and APO/FPO addresses allow 4-28 business days for Standard shipping. No expedited shipping. All orders placed with expedited shipping will be cancelled. Over 3, 000, 000 happy customers.
Add this copy of Modeling of Chemical Vapor Deposition of Tungsten Films to cart. $59.78, new condition, Sold by Paperbackshop rated 4.0 out of 5 stars, ships from Bensenville, IL, UNITED STATES, published 2013 by Birkhauser Basel.
Add this copy of Modeling of Chemical Vapor Deposition of Tungsten Films to cart. $75.61, good condition, Sold by Bonita rated 4.0 out of 5 stars, ships from Newport Coast, CA, UNITED STATES, published 2013 by Birkhäuser.
