Plasma Etching Processes for Interconnect Realization in VLSI

This is the first of two books presenting the challenges and future prospects of plasma etching processes for microelectronics, reviewing the past, present and future issues of etching processes in order to improve the understanding of these issues through innovative solutions. Read More

This is the first of two books presenting the challenges and future prospects of plasma etching processes for microelectronics, reviewing the past, present and future issues of etching processes in order to improve the understanding of these issues through innovative solutions. Read Less

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  	This is a digital edition of this title. Buy eBook Lifetime Access: $120.00 Title: Plasma Etching Processes for Interconnect Realization in Vlsi by Posseme, Nicolas Publisher: Elsevier S & T Print ISBN: 9781785480157, 1785480154 eText ISBN: 9780081005903 Edition: 2015 Format: EPUB eBook	$120.00 Buy eBook This is a digital eBook Nothing will be shipped to you Works with web browsers and the VitalSource app on all Windows, Mac, Chromebook, Kindle Fire, iOS, and Android devices Most eBooks are returnable within 14 days of purchase Questions? See our eBook FAQ