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Modeling of Chemical Vapor Deposition of Tungsten Films

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Modeling of Chemical Vapor Deposition of Tungsten Films - Kleijn, Chris R., and Werner, Christoph
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Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research ...

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Modeling of Chemical Vapor Deposition of Tungsten Films 2013, Birkhauser Verlag AG, Basel

ISBN-13: 9783034877435

Paperback

Modeling of Chemical Vapor Deposition of Tungsten Films 1993, Birkhauser

ISBN-13: 9780817628581

Illustrated

Hardcover

Modeling of Chemical Vapor Deposition of Tungsten Films 1993, Birkhauser, Basel

ISBN-13: 9783764328580

Hardcover