Like the bestselling original, this second edition of Microlithography is a self-contained text detailing both elementary and advanced aspects of submicron microlithography, offering a balanced treatment of theoretical and operating practices. Reflecting recently developed technologies, this edition includes coverage of immersion lithography, extreme ultraviolet (EUV) lithography, imprint lithography, photoresists for 193nm and immersion lithography, and scatterometry. The authors cover mechanical systems, optics, excimer ...
Read More
Like the bestselling original, this second edition of Microlithography is a self-contained text detailing both elementary and advanced aspects of submicron microlithography, offering a balanced treatment of theoretical and operating practices. Reflecting recently developed technologies, this edition includes coverage of immersion lithography, extreme ultraviolet (EUV) lithography, imprint lithography, photoresists for 193nm and immersion lithography, and scatterometry. The authors cover mechanical systems, optics, excimer laser light sources, and alignment techniques and analysis, as well as resist chemistry, processing, multilayer lithography, plasma and reactive ion etching, and metrology.
Read Less
Add this copy of Microlithography to cart. $178.63, like new condition, Sold by Media Smart rated 4.0 out of 5 stars, ships from Hawthorne, CA, UNITED STATES, published 2007 by Taylor & Francis Group.
