Provides an up-to-date assessment of chemically amplified resist materials chemistry and process considerations. Reports novel chemistry for single layer 193nm lithographic applications. Discusses new approaches to silicon-containing resists and multilevel processes. Explores the design of low-dielectric polymer materials for microelectronic applications.
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Provides an up-to-date assessment of chemically amplified resist materials chemistry and process considerations. Reports novel chemistry for single layer 193nm lithographic applications. Discusses new approaches to silicon-containing resists and multilevel processes. Explores the design of low-dielectric polymer materials for microelectronic applications.
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Seller's Description:
*Price HAS BEEN REDUCED by 10% until Monday, Sept. 9 (weekend sale item)* 563 pp., hardcover, ex library else text clean & binding tight. -If you are reading this, this item is actually (physically) in our stock and ready for shipment once ordered. We are not bookjackers. Buyer is responsible for any additional duties, taxes, or fees required by recipient's country.