This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles.
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This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles.
Read Less
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Seller's Description:
Good; Hardcover; 1993, Academic Press; Former library copy with standard library markings; Moderate wear to covers; Library stamps to endpapers; Text pages clean & unmarked; Good binding; Blue cloth covers with title in gold lettering on a black background; 677 pages; "Chemical Vapor Deposition: Principles and Applications, " by M. L. Hitchman & K. F. Jensen.
