Skip to main content alibris logo

Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications

by , ,

Write The First Customer Review
Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications - Kääriäinen, Tommi, and Cameron, David, and Kääriäinen, Marja-Leena
Filter Results
Item Condition
Seller Rating
Other Options
Change Currency

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the ...

loading
Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications 2013, Wiley-Scrivener

ISBN-13: 9781118062777

2nd edition

Hardcover