The Mexican Conference on Pattern Recognition 2010 (MCPR 2010) was the second event organized by the Mexican Association for Computer Vision, N- rocomputing and Robotics (MACVNR). These conferences provide a forum for exchanging scienti?c results and experiences, sharing new knowledge, and - creasing the cooperation between research groups in pattern recognition and related areas, in Mexico, as well as international cooperation. MCPR 2010 was held in Puebla, Mexico, it was hosted and sponsored by the Computer Science ...
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The Mexican Conference on Pattern Recognition 2010 (MCPR 2010) was the second event organized by the Mexican Association for Computer Vision, N- rocomputing and Robotics (MACVNR). These conferences provide a forum for exchanging scienti?c results and experiences, sharing new knowledge, and - creasing the cooperation between research groups in pattern recognition and related areas, in Mexico, as well as international cooperation. MCPR 2010 was held in Puebla, Mexico, it was hosted and sponsored by the Computer Science Department of the National Institute of Astrophysics, Optics and Electronics (INAOE), jointly with the Center for Computing Research of the National Polytechnic Institute (CIC-IPN). From 89 full papers submitted, 39(43.8%) were accepted for publication in theseproceedingsandfor presentationattheconference.Thecontributionsor- inated from 20 di?erent countries. The review process was carried out by the Scienti?c Committee, composed of internationally recognized scientists, all - perts in their respective ?elds. The conference bene?ted from the contributions made by the invited spe- ers: Edwin Hancock from the Department of Computer Science, University of York (UK); Guozhu Dong from the Data Mining Research Lab, Department of ComputerScienceandEngineering,WrightStateUniversity(USA);andErnesto Bribiesca Correa from the Department of Computer Science of the Center for Research in Applied Mathematics and Systems of the National Autonomous University of Mexico, IIMAS-UNAM (Mexico). We would like to express our sincere gratitude to the invited speakers.
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Add this copy of Advances in Pattern Recognition: Second Mexican to cart. $60.65, new condition, Sold by Ingram Customer Returns Center rated 5.0 out of 5 stars, ships from NV, USA, published 2010 by Springer-Verlag Berlin and Heidelberg GmbH & Co. K.
Edition:
2010, Springer-Verlag Berlin and Heidelberg GmbH & Co. K
Publisher:
Springer-Verlag Berlin and Heidelberg GmbH & Co. K
Published:
2010
Language:
English
Alibris ID:
17983324203
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New. Contains: Illustrations, black & white. Lecture Notes in Computer Science ; Image Processing, Computer Vision, Pattern Recognition, and Graphics . XIV, 384 p. 178 illus. Intended for professional and scholarly audience.
Add this copy of Advances in Pattern Recognition: Second Mexican to cart. $110.53, good condition, Sold by Bonita rated 4.0 out of 5 stars, ships from Newport Coast, CA, UNITED STATES, published 2010 by Springer.
Edition:
2010, Springer-Verlag Berlin and Heidelberg GmbH & Co. K
