Polymers for Microelectronics: Resists and Dielectrics

Presents recent advances in chemically amplified resists for deep UV, electron beam, and X-ray advanced lithographic technologies. Discusses top surface imaging and dry development resists. Examines the fundamental chemistry of radiation-sensitive materials, including dielectric polymers for integrated circuits and interconnect systems. Valuable reading for polymer chemists, radiation chemists, and materials scientists. Read More

Presents recent advances in chemically amplified resists for deep UV, electron beam, and X-ray advanced lithographic technologies. Discusses top surface imaging and dry development resists. Examines the fundamental chemistry of radiation-sensitive materials, including dielectric polymers for integrated circuits and interconnect systems. Valuable reading for polymer chemists, radiation chemists, and materials scientists. Read Less

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1994 Edition

ISBN:

0841227217

/ ISBN-13:

9780841227217

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  	Edition: 1994, American Chemical Society Hardcover, Good	Details: ISBN: 0841227217 ISBN-13: 9780841227217 Pages: 554 Publisher: American Chemical Society Published: 1994 Language: English Alibris ID: 18023316050	Shipping Options: Standard Shipping: $4.57 Choose your shipping method in Checkout. Costs may vary based on destination.
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1994, American Chemical Society, Washington, DC ISBN-13: 9780841227217 Hardcover See All from $50.26