This volume reviews the latest understanding of the behaviour and roles of oxygen in silicon from the experimental and theoretical points of view. Written by authorities from industrial and academic institutions, the chapters of the text cover oxygen-related phenomena from crystal growth to device fabrication processes, as well as diagnostic techniques. Coverage also includes discussion of silicon crystals for VLSI and ULSI applications.
Read More
This volume reviews the latest understanding of the behaviour and roles of oxygen in silicon from the experimental and theoretical points of view. Written by authorities from industrial and academic institutions, the chapters of the text cover oxygen-related phenomena from crystal growth to device fabrication processes, as well as diagnostic techniques. Coverage also includes discussion of silicon crystals for VLSI and ULSI applications.
Read Less
